Litho Cell 62 How Lithography Affects Etch Simulation for Lithography Engineers
نویسنده
چکیده
Is it a defect? Will it print? Accelerating shrinks depends on successful pattern transfer. 8 Precision and Process Control Maintaining an acceptable precision-to-tolerance ratio drives adoption of a new metrology technique for sub-0.18 µm linewidth control. Investigating and quantifying overlay accuracy is only as good as the data you have. 35 Exposing The SCAAM Eliminate anomalies that afflict common alt-PSM structures. Combating this new army of defects requires stealth and strategy. Simulation plays an important role in effective pattern transfer and offers a different perspective for the lithography engineer. Process Window Monitor™ (PWM) Series Automated CD process window metrology Quantox XP Inline, real-time electrical monitoring and characterization of gate dielectrics 71 SpectraFx 100 Advanced optical thin-film metrology
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